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The effusion cell is designed for elemental and compound evaporation and sublimation in a temperature range from 200°C to 1400°C. This source can be used to evaporate standard III-V MBE materials (e.g. Al, Ga, In) but may also be used as a doping source (e.g. Si or Be). Beside the standard crucible material PBN (Pyrolitic Boron Nitride) other cruicible materials such as Al2O3 , PG (Pyrolitic Graphite) or Quartz are also available.
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